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photoresist AZ2020 nanoholes array

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

photoresist AZ2020

Type Complex Compound
Formula
Role raw materials

Properties

Applications

Characterization

Method Nanomaterial Variant Source
field emission scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. 7GljoaovQzyVlTEOgOg5bPhFSVXbggdnrqFE3pUbZAD6SAHaK5
  2. mkDOCaFFY6NlhtnXl
Product

photoresist AZ2020 nanoholes array

Hole diameter: ~ 500 nm

Pitch size: ~ 900 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. H4NK4bQRuKMXwI1EzdEeS3r135Q2Vtr9XeldFF3mneUebyw4Qp
  2. MlIods6JOfrzk7eaP
Product

photoresist AZ2020 nanoholes array

Hole diameter: ~ 200 nm

Pitch size: ~ 400 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. OGNXUA3aXoyGD1nrIDASEw9ZkwRXuuxugO2UAlMEVT82FUcX5e
  2. 23Nf9gvvDAclTu3L4
Product

photoresist AZ2020 nanoholes array

Hole diameter: 150 nm

Pitch size: 300 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. 8MjLpEMCfUprAyhQsvBY8sVkdbVnCe7MBCkTYR0fHqU43oOkxc
  2. KSLgAL4clgHqJ9GY6
Product

photoresist AZ2020 nanoholes array

Line width: ~ 290 - ~ 300 nm

Pitch: ~ 530 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. rmnH1YE9bZMqYHuBkGZZ4rxEyNlUujvIB7yjSBlWEnBsyqGsw7
  2. PkeIIAwsMFs4iEapH
Product

photoresist AZ2020 nanoholes array

Line width: ~ 190 - 200 nm

Pitch: ~ 388 nm

Medium/Support: none

References

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