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photoresist AZ2020 nanoholes array

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

photoresist AZ2020

Type Complex Compound
Formula
Role raw materials

Properties

Applications

Characterization

Method Nanomaterial Variant Source
field emission scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. tQvN696v75mqPLzhCpQhnHonqYV4dI2T7zhUuxKS0AykBbRA2i
  2. PQnyrtJwjSiFjVciM
Product

photoresist AZ2020 nanoholes array

Line width: ~ 290 - ~ 300 nm

Pitch: ~ 530 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. z4OtjrD7ZfALzoc2lVOGtnuzUJNIavObCEyfeQ1ELj8709fz5m
  2. h9VXT4KMI8NRQJ1nW
Product

photoresist AZ2020 nanoholes array

Hole diameter: ~ 200 nm

Pitch size: ~ 400 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. gWFhDra9qAMk1pMm0GEHsWrqJw6Y0f3GmpSWCIhpcW2ekx5hoW
  2. E7Wqfu2g3hcwpSkRu
Product

photoresist AZ2020 nanoholes array

Line width: ~ 190 - 200 nm

Pitch: ~ 388 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. hEDgqETJVCycMtYFkY2lwrgqvgyCMn3wcbTyWuxlS66mAg1o6t
  2. ibUl5hJrxpit9LDlm
Product

photoresist AZ2020 nanoholes array

Hole diameter: 150 nm

Pitch size: 300 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  • photoresist AZ2020
  1. phDlZ0gsbv7AJER0d7LC5IAzJL7LvZs9vc0hMBRCfzlqnRlRFX
  2. RRldU3LZzMKZamJfb
Product

photoresist AZ2020 nanoholes array

Hole diameter: ~ 500 nm

Pitch size: ~ 900 nm

Medium/Support: none

References

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