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3-aminopropyltriethoxysilane-modified microstructured silicon post

Based on

3 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

(3-aminopropyl)-triethoxysilane moiety

(3-aminopropyl)trimethoxysilane moiety (3-aminopropyl)triethoxysilane moiety γ-aminopropyltriethoxy silane moiety 3-aminopropyltrimethoxysilane moiety 3-aminopropyltriethoxysilane moiety γ-aminopropyltriethoxysilane moiety (3-aminopropyl)trioxysilane moiety (3-aminopropyl)silanetrioxy group 3-aminopropylsilanetrioxy group 3-aminopropylsiloxy fragment 3-aminopropyl silane moiety 3-aminopropylsilane moiety γ-APTES moiety 3-APTS moiety APTES moiety APTMS moiety AMPS moiety APTS moiety APS moiety
Type Single Compound
Formula -C3H8NO3Si-
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
1-butyl-3-methylimidazolium tetrafluoroborate adhesion force

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Applications

Area Application Nanomaterial Variant Source
coatings

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. jjA3g4OShhL7uJV7liLHMWei8G10YfcwpFaE
  2. hlBexPeOuHP2y6nQcz7cQmV1
Product

3-aminopropyltriethoxysilane-modified microstructured silicon post

Panel spacing: 5000 nm

Panel width: 10000 nm

RMS roughness: 0.99 nm

Thickness: ~ 3.6 nm

Medium: none

Support: SiO2/Si

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • poly(dimethylsiloxane)
  1. ceidpdt2Yz2r
Product

3-aminopropyltriethoxysilane-modified microstructured silicon post

RMS roughness: 0.151 nm

Medium: none

Support: poly(dimethylsiloxane)

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. jHp8lwiAUcfFEz3ILhoJGccmfL8Tf2MWRkSA
  2. eImhOA4sDLf49Y9T7akfBf4b
Product

3-aminopropyltriethoxysilane-modified microstructured silicon post

Panel spacing: 5000 nm

Panel width: 30000 nm

RMS roughness: 0.99 nm

Thickness: ~ 3.6 nm

Medium: none

Support: SiO2/Si

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. GQC3CYrWRmDbRaQObedgTt9W77mHQtu8TMWu
  2. fAZ4xzl9fkv8JBrXlwOobs8y
Product

3-aminopropyltriethoxysilane-modified microstructured silicon post

Panel spacing: 5000 nm

Panel width: 20000 nm

RMS roughness: 0.99 nm

Thickness: ~ 3.6 nm

Medium: none

Support: SiO2/Si

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. rnS2GA6a1f1kBSXFm2Pw2sJXrPLdykKol9v9
  2. 36ho0lXQPC7Y6SKEAwpl4CWq
Product

3-aminopropyltriethoxysilane-modified microstructured silicon post

Panel spacing: 5000 nm

Panel width: 2000 nm

RMS roughness: 0.99 nm

Thickness: ~ 3.6 nm

Medium: none

Support: SiO2/Si

References

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