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resist grating structure

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

ZEP520A e-beam resist

Type Complex Compound
Formula
Role raw materials

Properties

Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • ZEP520A e-beam resist
  1. 4jpH12UFn3nlyR7
Product

resist grating structure

Hole diameter: ~ 40 nm

Medium/Support: none

References

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