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-CH3 terminated microstructured Si post

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

trimethoxypropylsilane moiety

Type Single Compound
Formula -C3H7O3Si-
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
1-butyl-3-methylimidazolium tetrafluoroborate adhesion force

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Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. K57cqLdiyvS4clgwA1Z9jZ15
Product

-CH3 terminated microstructured Si post

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. 24TTTX6uq0E1eMpaKtZdUbTSdhPhidklqndI
  2. JlfGK8efXtgGPxTDYRkSpH5g
Product

-CH3 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 2000 nm

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. L04i7vkyVuVBNQFvve57fMKvzYVFQksFy4uA
  2. NqDRFomuViR8KxyK1WCzcoAa
Product

-CH3 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 10000 nm

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. wfgYfeoHYuQI3J7LADDkCIAhuQK8EnQuEGKj
  2. REBRXMsPORBBvMrZTAX3X1IL
Product

-CH3 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 30000 nm

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. z3NoF6no3ApK5jD8XW45vxju5whPKh6LWGam
  2. RwcEByXzE6qxUXPB9rO8iScD
Product

-CH3 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 20000 nm

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

References

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