Loading ...

Fast insight into nanotechnology

Access easily searchable nanoscience data, synthesis methods and literature

HfO2-passivated SiN film on SiO2/Si

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
2

silicon-rich silicon nitride

Si-reached silicon nitride silicon nitride a-SiNx SRSN
Type Single Compound
Formula SiN(x)
Role layer
3

hafnium(IV) oxide

hafnium dioxide hafnium oxide hafnia
Type Single Compound
Formula HfO2
Role layer

Properties

Applications

Area Application Nanomaterial Variant Source
diagnostics

More information/entries available to subscribers only.

Or, view sample content

Characterization

Method Nanomaterial Variant Source
transmission electron microscopy

More information available to subscribers only.

Or, view sample content

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. JRnqFK
Product

HfO2-passivated SiN film on SiO2/Si

Central hole diameter: 800 nm

Side hole diameter: 450 nm

Thickness: 10 nm

Thickness: 100 nm

Thickness: 2500 nm

Window size: ~ 40000 - ~ 80000 nm

Medium: none

Support: silicon

References

Full content is available to subscribers only

To view content please choose from the following:

We use cookies to improve your experience with our site. More information

Sign up for a free trial