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Cu/HfO2/SiNx film on SiO2/Si

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
2

silicon-rich silicon nitride

Si-reached silicon nitride silicon nitride a-SiNx SRSN
Type Single Compound
Formula SiN(x)
Role layer
3

hafnium(IV) oxide

hafnium dioxide hafnium oxide hafnia
Type Single Compound
Formula HfO2
Role layer
4

copper

Type Single Compound
Formula Cu
Role layer

Properties

Applications

Area Application Nanomaterial Variant Source
diagnostics

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Product

Cu/HfO2/SiNx film on SiO2/Si

Central hole diameter: 800 nm

Side hole diameter: 450 nm

Thickness: 10 nm

Thickness: 100 nm

Thickness: 2500 nm

Thickness: ~ 200 nm

Window size: ~ 40000 - ~ 80000 nm

Medium: none

Support: silicon

References

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