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negative tapered profile nanohole array in gold thin film on silica membrane

Based on

7 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
2

gold

Type Single Compound
Formula Au
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electric field

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Applications

Area Application Nanomaterial Variant Source
photonics

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • SiO2/Si
  • gold
Product

negative tapered profile nanohole array in gold thin film on silica membrane

Thickness: 300 nm

Thickness: 80 nm

Medium: none

Support: p-doped silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  1. dUpWd8u5dDZQubkAGtr
  2. 8Q0o2qv5ny2uLJjjxNLZffsNm43r9M4Bo
Product

negative tapered profile nanohole array in gold thin film on silica membrane

Sphere diameter: 1580 nm

Thickness: 60 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • silicon
  1. pluGIaDgrb425sh1NjqK1BiZ0PxV
  2. 5LY8fRNhC3CXYGX
Product

negative tapered profile nanohole array in gold thin film on silica membrane

Sphere diameter: 760 - 800 nm

Thickness: 10 nm

Medium: none

Support: silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
Product

negative tapered profile nanohole array in gold thin film on silica membrane

Island diameter: ~ 10 - 100 nm

Periodicity: 200 nm

Pillar diameter: ~ 85 nm

Medium/Support: none

References

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