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lamellae-patterned polystyrene

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

alternating cross-linkable polystyrene/hydroxyl-terminated poly(styrene-ran-methyl methacrylate)

alternating XPS/PS-r-PMMA-OH
Type Nano Material
Formula
Role layer
2

polystyrene

PS
Type Polymer
Formula
Role layer

Properties

Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
  1. fj1nGPZCsDxRc
  2. ocRT
  3. np6kBw7
  4. zEHnH7s
Product

lamellae-patterned polystyrene

Interlamellar spacing: 27 nm

Thickness: 7 - 8 nm

Medium: none

Support: silicon

Method 2

Type: Chemical synthesis
Source:
  1. 0ADHDJCQD7u4M
  2. hMIb
  3. PJVvOY4
  4. jSIrLF2
Product

lamellae-patterned polystyrene

Interlamellar spacing: 27 nm

Offset shift: 6 - 32 nm

Thickness: 7 - 8 nm

Medium: none

Support: silicon

Method 3

Type: Chemical synthesis
Source:
  1. nrGPd5CBcmuft
  2. g8YK
  3. Jkh17zp
  4. 6dY41Dn
Product

lamellae-patterned polystyrene

Interlamellar spacing: 27 nm

Thickness: 7 - 8 nm

Medium: none

Support: silicon

Method 4

Type: Chemical synthesis
Source:
  1. 7o8ZFGuwwhwbM
  2. O2PB
  3. Ekpqgu5
  4. jTm8tm5
Product

lamellae-patterned polystyrene

Interlamellar spacing: 24.5 nm

Thickness: 7 - 8 nm

Medium: none

Support: silicon

Method 5

Type: Chemical synthesis
Source:
  1. vCHt6TqMeL8tX
  2. dUmE
  3. 2rfUIun
  4. 7uQzAyU
Product

lamellae-patterned polystyrene

Interlamellar spacing: 27 nm

Thickness: 7 - 8 nm

Medium: none

Support: silicon

References

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