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HAT-CN-coated AgNW film

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silver nanowires

Ag nanowires AgNW
Type Nano Material
Formula
Role layer
2

dipyrazino(2,3-f:2',3'-h)-quinoxaline-2,3,6,7,10,11-hexacarbonitrile

dipyrazino(2,3-f:2',3'-h)-quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2'3'-h] quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2'3'-h]quinoxaline-2,3,6,7,10,11-hex acarbonitrile 1,4,5,8,9,12-hexaaza-triphenylene-2,3,6,7,10,11-hexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylene-2,3,6,7,10,11-hexacarbonitrile 1,4,5,8,9,12-hexaazatriphenylene-2,3,6,7,10,11-hexacarbonitrile 2,3,6,7,10,11-hexacyano-1,4,5,8,9,12-hexaazatriphenylene 1,4,5,8,9,11- hexaazatriphenylene hexacarbonitrile 1,4,5,8,9,12-hexaazatriphenylene-hexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylenehexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylenehexacabonitrile hexaazatriphenylene hexacarbonitrile HAT(CN)6 HAT-CN HATCN HI-1 HAT
Type Single Compound
Formula C18N12
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
work function

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Applications

Area Application Nanomaterial Variant Source
optoelectronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. PJHODt
Product

HAT-CN-coated AgNW film

RMS roughness: 19.48 nm

Thickness: 50 nm

Medium: none

Support: polyethylene naphthalate

Method 2

Type: Physical formation
Source:
Starting materials
  1. gUn1mB
Product

HAT-CN-coated AgNW film

RMS roughness: 9.62 nm

Thickness: 200 nm

Medium: none

Support: polyethylene naphthalate

Method 3

Type: Physical formation
Source:
Starting materials
  1. OdHNNySQTOY
Product

HAT-CN-coated AgNW film

Thickness: 150 nm

Medium: none

Support: glass

Method 4

Type: Physical formation
Source:
Starting materials
  1. Eqb8Gg
Product

HAT-CN-coated AgNW film

Thickness: 1.2 nm

Medium: none

Support: polyethylene naphthalate

Method 5

Type: Physical formation
Source:
Starting materials
  1. eA6XlA
Product

HAT-CN-coated AgNW film

RMS roughness: 11.71 nm

Thickness: 150 nm

Medium: none

Support: polyethylene naphthalate

References

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