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extreme ultraviolet interference lithography transmission mask

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon nitride

Type Single Compound
Formula Si3N4
Role raw materials
2

chromium

Type Single Compound
Formula Cr
Role layer
3

gold

Type Single Compound
Formula Au
Role layer
4

nickel

Type Single Compound
Formula Ni
Role layer

Properties

Applications

Characterization

Method Source

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. Iv7Rim0oaY
Product

extreme ultraviolet interference lithography transmission mask

References

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