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line-space nanostructures

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon nitride

Type Single Compound
Formula Si3N4
Role layer
2

chromium

Type Single Compound
Formula Cr
Role partial layer
3

HfO-based photoresist

Inpria XE15IB Inpria resist Inpria IB Inpria IB
Type Complex Compound
Formula
Role layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. bILChnZ08WG9WKvIwXFe2YjFCTAqh
  2. kIYjkwpKFrYDD8MUe4GR
Product

line-space nanostructures

Grating pitch: 40 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. XKypZZTmkdrOc2G9abeZX0nEbr9Jf
  2. hrPUvYnffO6MWDBYBA5Y
Product

line-space nanostructures

Grating pitch: 28 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. hfUImqVeiCRcUdKNMYjKFrTA0eCaK
  2. lzHjfp99h9aevfUOhiTs
Product

line-space nanostructures

Grating pitch: 32 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. DiChlhHjQ4kdGYJwUVmtdAdGEj4SG
  2. J0VZYXjWVAOymC1bTapu
Product

line-space nanostructures

Grating pitch: 36 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

References

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