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line-space nanostructures

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon nitride

Type Single Compound
Formula Si3N4
Role layer
2

chromium

Type Single Compound
Formula Cr
Role layer
3

HfO-based photoresist

Inpria XE15IB Inpria resist Inpria IB Inpria IB
Type Complex Compound
Formula
Role partial layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. 0m07p9JGO7jJc
Product

line-space nanostructures

Grating pitch: 40 nm

Line gratings height: ~ 20 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. bgo8SBHxIcuc0
Product

line-space nanostructures

Grating pitch: 32 nm

Line gratings height: ~ 20 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. b0oGmpSJOzMEi
Product

line-space nanostructures

Grating pitch: 36 nm

Line gratings height: ~ 20 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. JbEhzFrC0WQSf
Product

line-space nanostructures

Grating pitch: 28 nm

Line gratings height: ~ 20 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

References

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