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polystyrene nanospheres assembled to microstructured template

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

poly(dimethylsiloxane)-imprinted photoresist

Type Complex Compound
Formula
Role layer
2

polystyrene nanoparticles

polystyrene nanospheres PS nanoparticles PS nanospheres polystyrene NP PS NP
Type Nano Material
Formula
Role partial layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon
  • photoresist Sumitomo PFi88A7
Product

polystyrene nanospheres assembled to microstructured template

Distance between trenches: 1000 nm

Trench depth: 200 nm

Trench width: 4000 nm

Medium: none

Support: silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • silicon
  • photoresist Sumitomo PFi88A7
Product

polystyrene nanospheres assembled to microstructured template

Distance between trenches: 1000 nm

Trench depth: 200 nm

Trench width: 4000 nm

Medium: none

Support: silicon

Method 3

Type: Physical formation
Source:
Starting materials
  • silicon
  • photoresist Sumitomo PFi88A7
Product

polystyrene nanospheres assembled to microstructured template

Distance between trenches: 2000 nm

Trench width: 8000 nm

Medium: none

Support: silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • silicon
  • photoresist Sumitomo PFi88A7
Product

polystyrene nanospheres assembled to microstructured template

Distance between trenches: 1000 nm

Trench depth: 200 nm

Trench width: 4000 nm

Medium: none

Support: silicon

References

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