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graphene/ethyl cellulose ink pattern on Si/SiO2 wafer

Based on

1 Articles
1 Patents
2015 Most recent source

Composition

1

cured coating material containing thin plate-like graphenic carbon particles

Type Nano Material
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electrical resistivity

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Applications

Area Application Nanomaterial Variant Source
building and construction

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. tALp4v2bGx5ZGtd2Bsdqz4EENsPZbcXb1HmAvKiq5alZkL
Product

graphene/ethyl cellulose ink pattern on Si/SiO2 wafer

Size: not specified

Medium: none

Support: Si/SiO2 wafer

Method 2

Type: Physical formation
Source:
Starting materials
  1. 0JrOY8RMhQddSLStdQhfKZJSxjYftL6kQcc2eLq0u60pgc
Product

graphene/ethyl cellulose ink pattern on Si/SiO2 wafer

Size: not specified

Medium: none

Support: Si/SiO2 wafer

Method 3

Type: Chemical synthesis
Source:
Starting materials
Product

graphene/ethyl cellulose ink pattern on Si/SiO2 wafer

Thickness: < 5000 nm

Medium: none

Support: galvanized steel

References

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