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few-layer MoS2 film on SiO2/Si

Based on

3 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
2

molybdenum(IV) sulfide

2H-MoS2
Type Single Compound
Formula MoS2
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
band energy diagram

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Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • p-doped silicon
  1. lC
  2. VgDD
Product

few-layer MoS2 film on SiO2/Si

Thickness: 3 - 5 nm

Thickness: 40 nm

Medium: none

Support: p-doped silicon

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • diethyl disulfide
  • SiO2/Si
  • bis(tert-butylimido)bis(dimethylamino)molybdenum(VI)
  1. YRTyd
  2. WZeEI
  3. kzx5Kn5L6
Product

few-layer MoS2 film on SiO2/Si

RMS roughness: 2.4 nm

Thickness: 3.88 - 4.28 nm

Thickness: 90 nm

Medium: none

Support: silicon

Method 3

Type: Physical formation
Source:
Starting materials
Product

few-layer MoS2 film on SiO2/Si

Thickness: 90 nm

Thickness: ~ 0.9 nm

Medium: none

Support: highly n-doped silicon

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • diethyl disulfide
  • SiO2/Si
  • bis(tert-butylimido)bis(dimethylamino)molybdenum(VI)
  1. TJrRH
  2. XEAtb
  3. mJFfdZ4bx
Product

few-layer MoS2 film on SiO2/Si

RMS roughness: ~ 1.7 nm

Thickness: 90 nm

Medium: none

Support: silicon

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • diethyl disulfide
  • SiO2/Si
  • bis(tert-butylimido)bis(dimethylamino)molybdenum(VI)
  1. yLPhk
  2. jeVrb
  3. WhltcHXu
Product

few-layer MoS2 film on SiO2/Si

Thickness: 90 nm

Medium: none

Support: silicon

References

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