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Au/HfO2/p-Si metal-oxide-semiconductor structure

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

hafnium(IV) oxide

hafnium dioxide hafnium oxide hafnia
Type Single Compound
Formula HfO2
Role layer
2

chromium

Type Single Compound
Formula Cr
Role layer
3

gold

Type Single Compound
Formula Au
Role layer
4

gold

Type Single Compound
Formula Au
Role partial layer

Properties

General physical and chemical properties

Property Value Source

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Applications

Area Application Source

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Characterization

Method Source

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • tetrakis(dimethylamido)-hafnium(IV)
  • boron doped silicon
  • water
  1. zhO3XV
Product

Au/HfO2/p-Si metal-oxide-semiconductor structure

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • tetrakis(dimethylamido)-hafnium(IV)
  • boron doped silicon
  • water
  1. F7T8sz
Product

Au/HfO2/p-Si metal-oxide-semiconductor structure

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • tetrakis(dimethylamido)-hafnium(IV)
  • water
  • boron doped silicon
  1. 6SewiQ
Product

Au/HfO2/p-Si metal-oxide-semiconductor structure

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • tetrakis(dimethylamido)-hafnium(IV)
  • boron doped silicon
  • water
  1. R1oaSt
Product

Au/HfO2/p-Si metal-oxide-semiconductor structure

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • tetrakis(dimethylamido)-hafnium(IV)
  • boron doped silicon
  • water
  1. ZQtChg
Product

Au/HfO2/p-Si metal-oxide-semiconductor structure

References

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