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copper film on ruthenium substrate

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

ruthenium film on silicon

Type Nano Material
Formula
Role layer
2

copper

Type Single Compound
Formula Cu
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electrochemical stripping plot

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Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. XCUKjKqIXtCx3r9R6IfmNUAIqJxY0Qzc
  2. Cr5jikVJk0HyCe9byMlaWneKXmA
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  6. ZIP
Product

copper film on ruthenium substrate

RMS roughness: 2.65 nm

Thickness: 8.02 - 8.98 nm

Medium: none

Support: silicon

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. DjAnROO9ZcuuoLpHEURPU1DVxvrmtXp3
  2. I7qseImoYfmnkmR5JBtdNla91Y4CNQ61
  3. Y0ZVq7r
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  6. t8S
Product

copper film on ruthenium substrate

RMS roughness: 1.76 nm

Thickness: 9.30 - 10.15 nm

Medium: none

Support: silicon

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. f6UfuUYwnj8SbIVaihmXm5IOLc3rGsX9
  2. uPQZ8agL7MR7QQpNRIn2iVuq6pW
  3. RBZc5YU
  4. mTj
  5. 7P6qq
  6. RyAE
Product

copper film on ruthenium substrate

RMS roughness: 2.02 nm

Medium: none

Support: silicon

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. hy0EwvxvoWMqWfXL9y1lTye6jv3Posse
  2. n4Jpr0TyIfRD4YztNQ22CdTOKyM
  3. JVdSNp7
  4. 0H3
  5. 2rFX5
  6. kig
Product

copper film on ruthenium substrate

RMS roughness: 1.76 nm

Thickness: 9.30 - 10.15 nm

Medium: none

Support: silicon

Method 5

Type: Chemical synthesis
Source:
Starting materials
  1. sVCmJ1QZ2MYynBO5vtpB98HhETd2C4Z3
  2. kPbIXMz5eJAI4reUvCzzVSZ9i7rZYSKE
  3. dUZRYNT
  4. jKV
  5. PjAcp
  6. 9sy
Product

copper film on ruthenium substrate

RMS roughness: 2.65 nm

Thickness: 8.02 - 8.98 nm

Medium: none

Support: silicon

References

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