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silica-capped germanium telluride thin film

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

germanium telluride

Type Single Compound
Formula Ge50.7Te49.3
Role layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
temperature dependent on laser energy

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Applications

Area Application Nanomaterial Variant Source
data storage

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Characterization

Method Nanomaterial Variant Source
Rutherford backscattering spectrometry

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. BtoRmtw9RWAmvJengUH5RTN
Product

silica-capped germanium telluride thin film

Thickness: ~ 30 nm

Thickness: ~ 8 nm

Medium: none

Support: silicon

Method 2

Type: Physical formation
Source:
Starting materials
  1. 71D0vFZ2QVIwMAnJCwE2sjtS4
Product

silica-capped germanium telluride thin film

Thickness: ~ 30 nm

Thickness: ~ 8 nm

Wavelength of thickness variation: ~ 500 nm

Medium: none

Support: silicon

Method 3

Type: Physical formation
Source:
Starting materials
  1. 42xPx6Xt4wFWBjMXFZtclae2T
Product

silica-capped germanium telluride thin film

Thickness: ~ 30 nm

Thickness: ~ 8 nm

Wavelength of thickness variation: ~ 500 nm

Medium: none

Support: silicon

Method 4

Type: Physical formation
Source:
Starting materials
  1. 1hrhBIiYpAqqXBuhctv85kw
Product

silica-capped germanium telluride thin film

Thickness: ~ 30 nm

Thickness: ~ 8 nm

Medium: none

Support: silicon

Method 5

Type: Physical formation
Source:
Starting materials
  1. vaPpNU3ahVATseuSxweE3E1vh
Product

silica-capped germanium telluride thin film

Thickness: ~ 30 nm

Thickness: ~ 8 nm

Wavelength of thickness variation: ~ 390 nm

Medium: none

Support: silicon

References

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