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SixNy thin film

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon nitride

SixNy
Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
capacitance density dependent on sweep cycle number

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Applications

Area Application Nanomaterial Variant Source
data storage

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Characterization

Method Nanomaterial Variant Source
infrared spectroscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • octachlorotrisilane
  1. jMv0AZ2VvL6dskXg800TARokdhfuDjLe8qlch
  2. A1rBdlxiFgBwy5PA1XrgN25FU0kM5HO
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 24 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • octachlorotrisilane
  1. gxPRsFiweBofuIH2bBdEE2FfVutGDqdGwrCGX
  2. BEgvs5K2S8mfXGMe0jIdwVOxnaAnrUI
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 15 - 35 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • octachlorotrisilane
  1. GDf0AdBotwOLGdm5WfXTgVerh3DJcUHF99anv
  2. e1cBtJLXSJJ4NlhJwnjzRkasQHkBhcj
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 15 - 35 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • ammonia
  • octachlorotrisilane
  1. 7PfEoiW2rC9THPfGEMJGZ1yPbaznT7sOxbVOR
  2. 1YAmx7GlwIb6eENi6VsXmbU6kRvpopF
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 24 nm

Medium: none

Support: SiO2/Si

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • octachlorotrisilane
  1. YFlelEta0wCN8NA0SIp65bNNnqZrcgFQ98rXr
  2. mpBgSIAsd0kLYIqJ0pmj6BcBQxFgWzf
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 15 - 35 nm

Medium/Support: none

References

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