Loading ...

Fast insight into nanotechnology

Access easily searchable nanoscience data, synthesis methods and literature

SiOxCyFz thin film

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

fluorinated silica

SiOxCyFz
Type Complex Compound
Formula
Role raw materials
2

atomic hydrogen

hydrogen atom
Type Single Compound
Formula H
Role dopant

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
absorption coefficient

More information/entries available to subscribers only.

Or, view sample content

Applications

Area Application Nanomaterial Variant Source
optoelectronics

More information available to subscribers only.

Or, view sample content

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

More information/entries available to subscribers only.

Or, view sample content

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicic acid tetraethyl ester
  • oxygen
  • carbon tetrafluoride
  1. dWBRu4iqa9s78TdUiFNwnPfbCS4fkK
Product

SiOxCyFz thin film

Roughness: 0.3 nm

Thickness: 50 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • carbon tetrafluoride
  • silicic acid tetraethyl ester
  • oxygen
  1. lRdCful4A72loERs7egPKP6DFATllli2dxZfpQc
Product

SiOxCyFz thin film

Thickness: 50 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • oxygen
  • silicic acid tetraethyl ester
  • carbon tetrafluoride
  1. 4GJZvuzvvFo4n2lXuZgYxQ6kh866yZ
Product

SiOxCyFz thin film

Thickness: 50 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • carbon tetrafluoride
  • oxygen
  • silicic acid tetraethyl ester
  1. BLsRSCANmJ6jwYWmEhIoU8eBfH7bPIKWHucvz9H
Product

SiOxCyFz thin film

Roughness: 2.5 nm

Thickness: 50 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • oxygen
  • carbon tetrafluoride
  • silicic acid tetraethyl ester
  1. zefCkjeyux5Fhxq9e20avQkCdWeoLjRTK4gLz4Z
Product

SiOxCyFz thin film

Roughness: 0.3 nm

Thickness: 50 nm

Medium/Support: none

References

Full content is available to subscribers only

To view content please choose from the following:

We use cookies to improve your experience with our site. More information

Sign up for a free trial