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indium tin oxide/lithium hydroxide doped tris(8-hydroxyquinoline)aluminium/tris(8-hydroxyquinoline)aluminium/lithium fluoride/aluminium multilayer

Based on

1 Articles
2014 Most recent source

Composition

1

tin-doped indium oxide

indium tin oxide ITO
Type Complex Compound
Formula
Role layer
2

lithium hydroxide doped tris(8-hydroxyquinoline)aluminium

Alq3:LiOH
Type Complex Compound
Formula
Role layer
3

tris(8-hydroxyquinolinato)aluminium

tris(8-hydroxyquinoline)aluminum 8-hydroxyquinoline aluminum salt aluminum 8-hydroxyquinolinate Alq3 Alq3
Type Single Compound
Formula C27H18AlN3O3
Role layer
4

lithium fluoride

Type Single Compound
Formula LiF
Role layer
5

aluminium

aluminum
Type Single Compound
Formula Al
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
current density

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Applications

Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • indium tin oxide glass
  • lithium hydroxide doped tris(8-hydroxyquinoline)aluminium
Product

indium tin oxide/lithium hydroxide doped tris(8-hydroxyquinoline)aluminium/tris(8-hydroxyquinoline)aluminium/lithium fluoride/aluminium multilayer

Thickness: 1 nm

Thickness: 10 nm

Thickness: 100 nm

Thickness: 200 nm

Thickness: 30 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • indium tin oxide glass
  • lithium hydroxide doped tris(8-hydroxyquinoline)aluminium
Product

indium tin oxide/lithium hydroxide doped tris(8-hydroxyquinoline)aluminium/tris(8-hydroxyquinoline)aluminium/lithium fluoride/aluminium multilayer

Thickness: 1 nm

Thickness: 10 nm

Thickness: 100 nm

Thickness: 200 nm

Thickness: 30 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • lithium fluoride doped tris(8-hydroxyquinoline)aluminium
  • indium tin oxide glass
Product

indium tin oxide/lithium hydroxide doped tris(8-hydroxyquinoline)aluminium/tris(8-hydroxyquinoline)aluminium/lithium fluoride/aluminium multilayer

Thickness: 1 nm

Thickness: 10 nm

Thickness: 100 nm

Thickness: 200 nm

Thickness: 30 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • indium tin oxide glass
  • lithium hydroxide doped tris(8-hydroxyquinoline)aluminium
Product

indium tin oxide/lithium hydroxide doped tris(8-hydroxyquinoline)aluminium/tris(8-hydroxyquinoline)aluminium/lithium fluoride/aluminium multilayer

Thickness: 1 nm

Thickness: 10 nm

Thickness: 100 nm

Thickness: 200 nm

Thickness: 30 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  • indium tin oxide glass
  • lithium hydroxide doped tris(8-hydroxyquinoline)aluminium
Product

indium tin oxide/lithium hydroxide doped tris(8-hydroxyquinoline)aluminium/tris(8-hydroxyquinoline)aluminium/lithium fluoride/aluminium multilayer

Thickness: 1 nm

Thickness: 10 nm

Thickness: 100 nm

Thickness: 200 nm

Thickness: 30 nm

Medium/Support: none

References

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