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aluminum nanolines on photoresist surface

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

tin-doped indium oxide

indium tin oxide ITO
Type Complex Compound
Formula
Role layer
2

positive photoresist S1805

Type Complex Compound
Formula
Role partial layer
3

aluminium nanoparticles

Al nanoparticles
Type Nano Material
Formula
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
duty cycle

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Applications

Area Application Nanomaterial Variant Source
sensors (excluding biosensors)

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
Product

aluminum nanolines on photoresist surface

Height: ~ 200 nm

Periodicity: 580 nm

Thickness: 100 nm

Thickness: 200 nm

Width: ~ 160 nm

Medium: none

Support: soda-lime-silica glass

References

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