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mesoporous n++-Si layer

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

phosphorus-doped silicon

n++-Si
Type Complex Compound
Formula
Role raw materials

Properties

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • phosphorus-doped silicon
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  3. vK86
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Product

mesoporous n++-Si layer

Diameter: ~ 45 nm

Thickness: > 1000 nm

Medium: none

Support: phosphorus-doped silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • phosphorus-doped silicon
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  2. dgnkmZDOGZ6QyT4RBmGtMxq
  3. ugokRisv8espkh8OxxxCg
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  6. fo5EXttYmBAlBHZLq3hAT
Product

mesoporous n++-Si layer

Diameter: ~ 7 nm

Thickness: ~ 345 nm

Medium: none

Support: phosphorus-doped silicon

References

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