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polymer film

Based on

1 Patents
2014 Most recent source

Composition

1

poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4)

Type Polymer
Formula
Role raw materials
2

C30H31F6NO5S3

Type Single Compound
Formula C30H31F6NO5S3
Role raw materials
3

tetra(n-butylammonium)hydroxide

tetra-n-butylammonium hydroxide tetrabutylammonium hydroxide tetrabutylammonium TBA hydroxide TBA-OH TBAOH TBAH TBA
Type Single Compound
Formula C16H37NO
Role raw materials
4

3-hydroxy-2-naphthalene carboxylic acid

3-hydroxy-2-naphthalenic acid 3-hydroxy-2-naphthylic acid 2-hydroxy-3-naphthoic acid 3-hydroxy-2-naphthoic acid 3H2NCA
Type Single Compound
Formula C11H8O3
Role raw materials
5

polysiloxane KP-341

Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electron beam sensitivity

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Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • 3-hydroxy-2-naphthalene carboxylic acid
  • tetra(n-butylammonium)hydroxide
See all (5)
  1. ovG9c2xgF0PZuvTnwCn2Qib1XouaumxBOjALe3Tlx6qvmoueFkV90lG42LsnRBY
Product

polymer film

Thickness: 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • 3-hydroxy-2-naphthalene carboxylic acid
  • poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4)
See all (5)
  1. tnMlnPva0ahIlknpGtHwKtvb0CIkJOjRieMrjlTZtjxEbbVUgV2dBDfN2jVznwB
Product

polymer film

Thickness: 50 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • 3-hydroxy-2-naphthalene carboxylic acid
  • poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4)
See all (5)
  1. CvxST6prGWFavHB8uhL0MRRxDhhFf1uNFK2XFYAJPmfyqbckQSjbHWjA7JxLk7U
Product

polymer film

Thickness: 100 nm

Medium/Support: none

References

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