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polymer film

Based on

1 Patents
2014 Most recent source

Composition

1

poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4)

Type Polymer
Formula
Role raw materials
2

C24H15F5O3S2

Type Single Compound
Formula C24H15F5O3S2
Role raw materials
3

tetra(n-butylammonium)hydroxide

tetra-n-butylammonium hydroxide tetrabutylammonium hydroxide tetrabutylammonium TBA hydroxide TBA-OH TBAOH TBAH TBA
Type Single Compound
Formula C16H37NO
Role raw materials
4

C41H52O9

Type Single Compound
Formula C41H52O9
Role raw materials
5

C14H22O3

Type Single Compound
Formula C14H22O3
Role raw materials
6

3-hydroxy-2-naphthalene carboxylic acid

3-hydroxy-2-naphthalenic acid 3-hydroxy-2-naphthylic acid 2-hydroxy-3-naphthoic acid 3-hydroxy-2-naphthoic acid 3H2NCA
Type Single Compound
Formula C11H8O3
Role raw materials
7

polysiloxane KP-341

Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electron beam sensitivity

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Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • 3-hydroxy-2-naphthalene carboxylic acid
  • poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4)
See all (7)
  1. ukdA5ravff2mTUuoRuTIxRKQTBYeaduKD6KRUNSCRbGJ80vAWW9NFSM0EftE8LXbjx16UhPT7ihCTsW
Product

polymer film

Thickness: 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • 3-hydroxy-2-naphthalene carboxylic acid
  • poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4)
See all (7)
  1. lmDsQBBGX9ti2aKKbNl9TCaLuYyFqh9HTd5jOyJaAoq5UPOdkTBHxgMVBXtBo0cyzELx9tv79WYf3IY
Product

polymer film

Thickness: 50 nm

Medium/Support: none

References

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