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camphor sulfonic acid-doped polypyrrole patterned film on N-(3-trimethoxysilylpropyl)pyrrole-treated SiO2/Si coated with patterned positive photoresist KMP C5315

Based on

1 Articles
2015 Most recent source

Composition

1

positive photoresist KMP C5315

Type Complex Compound
Formula
Role partial layer
2

camphor sulfonic acid-doped polypyrrole nano-thin film on N-(3-trimethoxysilylpropyl)pyrrole-treated SiO2/Si

CSA-doped PPy nano-thin film on N-(3-trimethoxysilylpropyl)pyrrole-treated SiO2/Si
Type Nano Material
Formula
Role partial layer

Properties

Applications

Characterization

Method Source

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  1. QR3VtYc
Product

camphor sulfonic acid-doped polypyrrole patterned film on N-(3-trimethoxysilylpropyl)pyrrole-treated SiO2/Si coated with patterned positive photoresist KMP C5315

References

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