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block copolymer nanoporous mask

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
2

poly(styrene-r-methylmethacrylate)

P(S-r-MMA)
Type Polymer
Formula
Role partial layer
3

polystyrene

PS
Type Polymer
Formula
Role partial layer

Properties

Applications

Characterization

Method Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. vfCO3lKa7eSnd3Xq
Product

block copolymer nanoporous mask

Method 2

Type: Physical formation
Source:
Starting materials
  1. uovYMaWpSWpkTSy2
Product

block copolymer nanoporous mask

References

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