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Al/HfO2/p-Si metal-oxidee-semiconductor structure

Based on

1 Articles
2012 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

aluminium

aluminum
Type Single Compound
Formula Al
Role layer
2

p-doped silicon

p-Si
Type Complex Compound
Formula
Role layer
3

hafnium(IV) oxide

hafnium dioxide hafnium oxide hafnia
Type Single Compound
Formula HfO2
Role layer
4

aluminium

aluminum
Type Single Compound
Formula Al
Role partial layer

Properties

General physical and chemical properties

Property Value Source
capacitance dependent on temperature

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Applications

Area Application Source
electronics

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • hafnium(IV) oxide
  • p-doped silicon
Product

Al/HfO2/p-Si metal-oxidee-semiconductor structure

References

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