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n+-type SiHx film

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

phosphorus-doped amorphous hydrated silicon

n+-a-SiHx
Type Complex Compound
Formula
Role raw materials

Properties

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. amBm2v
  2. gEK20EGdklrBKypeBOQua12mK04wDOpMnzl8i
Product

n+-type SiHx film

RMS roughness: 1.824 nm

Roughness: 1.237 nm

Thickness: 33 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. fUhuiK
  2. 99K79Q9ZMTsNzrcUXS2StEy9MFipCv28IuYLX
Product

n+-type SiHx film

RMS roughness: 6.245 nm

Roughness: 5.534 nm

Thickness: 33 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. ydprSo
  2. ziS6E9BauS4d0FKtbpVeN3YDNfOJ6Z9VFl6Ne
Product

n+-type SiHx film

RMS roughness: 1.592 nm

Roughness: 0.936 nm

Thickness: 33 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. okRWQI
  2. VkorcD4kxawPCEJMtarwJoKayhl1SvYd9ZruPw
Product

n+-type SiHx film

RMS roughness: 1.356 nm

Roughness: 0.706 nm

Thickness: 33 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. CMmlPz
  2. BaENK4T62e9u5pHETyG9uEyUivoLdEKbHRRjE
Product

n+-type SiHx film

RMS roughness: 2.073 nm

Roughness: 1.318 nm

Thickness: 33 nm

Medium/Support: none

References

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