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n+-type SiHx film

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

phosphorus-doped amorphous hydrated silicon

n+-a-SiHx
Type Complex Compound
Formula
Role raw materials

Properties

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. J1rcHG
  2. tu5D5AXqaCumlXFW9Q4xrFt01Gi5ZUIjdeJ9K
Product

n+-type SiHx film

RMS roughness: 1.824 nm

Roughness: 1.237 nm

Thickness: 33 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. y5JI9Z
  2. lGYL0YhIBjfpqOgAnBygZOx92nC3dtUx3jgA6
Product

n+-type SiHx film

RMS roughness: 6.245 nm

Roughness: 5.534 nm

Thickness: 33 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. Oqxx5h
  2. WN7Cl4o0uFEc6X5LYGXN7xKidebU6PqIEdy3k
Product

n+-type SiHx film

RMS roughness: 1.592 nm

Roughness: 0.936 nm

Thickness: 33 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. OYAFWH
  2. f8iZ4yPjtGAabYKdgT3Dgpzvhw49WgiYPD7QrY
Product

n+-type SiHx film

RMS roughness: 1.356 nm

Roughness: 0.706 nm

Thickness: 33 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • phosphine
  • hydrogen
  • silicon hydride
  1. CUDa7T
  2. b3nVX1nENWr2rfvSoaI9CBu75hbSTtGwcKhZY
Product

n+-type SiHx film

RMS roughness: 2.073 nm

Roughness: 1.318 nm

Thickness: 33 nm

Medium/Support: none

References

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