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poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Based on

7 Articles
2016 Most recent source

Composition

1

poly(3-hexylthiophene)

P3HT
Type Polymer
Formula
Role raw materials
2

[6,6]-phenyl-C61-butyric acid methyl ester

[6,6]-phenyl-C61-butyric acid methyl ester PCBM
Type Single Compound
Formula C72H14O2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electron mobility

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Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. KlobIRLQwYjNuQjjZDyrNC147dyxHjpDIuDAfX5
  2. Y7DKh68
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

Method 2

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. TE3MpeUT52NvVevDcOPJUC3xDVctG6xnU1wa4W3
  2. HcYNZvY
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

Method 3

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. VmYGH4AOORvCwlDkV1a
  2. Y5JhJrH
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Cluster size: ~ 10 - 20 nm

RMS roughness: 2.3 nm

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

Method 4

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. 1FGSBAXPRURFc
  2. o2mugae
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Cluster size: ~ 10 - 20 nm

RMS roughness: 2.7 nm

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

Method 5

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. sUtj2UKmEFL2uWgMOcnAwqKfPqnKB2t6XUeJF9O
  2. iU9V0tQ
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Cluster size: ~ 10 - 20 nm

RMS roughness: 1.7 nm

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

References

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