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poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Based on

7 Articles
2016 Most recent source

Composition

1

poly(3-hexylthiophene)

P3HT
Type Polymer
Formula
Role raw materials
2

[6,6]-phenyl-C61-butyric acid methyl ester

[6,6]-phenyl-C61-butyric acid methyl ester PCBM
Type Single Compound
Formula C72H14O2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electron mobility

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Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. JSboMRY2w6ORIeMMASDYdKFInEcoBVnIIxfw9Lv
  2. 4SA7Mwm
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

Method 2

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. JhXFTxdD89yzJsUDDmq9IwjUy5efPbIjTR3XwHH
  2. bkfXc3c
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

Method 3

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. fTGQv6gvrvfve8F5ZAm
  2. DnPSQYw
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Cluster size: ~ 10 - 20 nm

RMS roughness: 2.3 nm

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

Method 4

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. 3bIcOY8NI8CGm
  2. b6u4wsJ
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Cluster size: ~ 10 - 20 nm

RMS roughness: 2.7 nm

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

Method 5

Type: Physical formation
Source:
Starting materials
  • poly(3-hexylthiophene)
  • [6,6]-phenyl-C61-butyric acid methyl ester
  1. esg19nPSiSypKtVEdGOoGZqIx8JvYbGzUzR7Sdp
  2. DfQmLqn
Product

poly(3-hexylthiophene):[6]-phenyl-C61-butyric acid methyl ester film

Cluster size: ~ 10 - 20 nm

RMS roughness: 1.7 nm

Thickness: 130 - 160 nm

Medium: none

Support: glass/indium tin oxide/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)

References

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