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C18Si SAM on Si/SiO2 wafer

Based on

2 Articles
2013 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

n-octadecyldimethylchlorosilane

chlorodimethyloctadecylsilane octadecyldimethylchlorosilane ODMS
Type Single Compound
Formula C20H43ClSi
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
surface energy

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Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
  1. CxNmy2gH
Product

C18Si SAM on Si/SiO2 wafer

Thickness: 0.6 - 2.4 nm

Medium: none

Support: Si/SiO2 substrate

Method 2

Type: Physical formation
Source:
Starting materials
  • silicon
  • n-octadecyldimethylchlorosilane
  1. Dq6wX
Product

C18Si SAM on Si/SiO2 wafer

Thickness: 1.52 - 1.70 nm

Medium: none

Support: silicon

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Si/SiO2 substrate
  • n-octadecyldimethylchlorosilane
  1. FLCuRN7DB69dgGUKUi
  2. ohFQtO5QEXo6W66DKLC9ZuA
Product

C18Si SAM on Si/SiO2 wafer

Thickness: 0.6 - 2.4 nm

Medium: none

Support: Si/SiO2 substrate

Method 4

Type: Physical formation
Source:
  1. p9qZ0baB
Product

C18Si SAM on Si/SiO2 wafer

Thickness: 0.6 - 2.4 nm

Medium: none

Support: Si/SiO2 substrate

References

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