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HfZrON/SiO2 gate stack structure

Based on

1 Articles
2012 Most recent source

Composition

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
2

hafnium zirconate

Type Single Compound
Formula HfZrO2
Role layer
3

atomic nitrogen

nitrogen atom
Type Single Compound
Formula N
Role dopant

Properties

General physical and chemical properties

Property Value Source
leakage current

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Applications

Characterization

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. 3fCx2Rx
Product

HfZrON/SiO2 gate stack structure

Method 2

Type: Chemical synthesis
Source:
Starting materials
Product

HfZrON/SiO2 gate stack structure

References

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