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fractured photoresist/SiO2 layer/Si

Based on

1 Articles
2012 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon

Type Single Compound
Formula Si
Role layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
3

photoresist

Type Polymer
Formula
Role partial layer

Properties

Applications

Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
  1. 7Wh5Zi1
Product

fractured photoresist/SiO2 layer/Si

Thickness: 100 nm

Thickness: 550 - 600 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
  1. fvyaSwH
Product

fractured photoresist/SiO2 layer/Si

Thickness: 100 nm

Thickness: > 1200 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
  1. dTUsxS9
Product

fractured photoresist/SiO2 layer/Si

Thickness: 100 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
  1. tnoCeKK
Product

fractured photoresist/SiO2 layer/Si

Thickness: 100 nm

Thickness: 650 - 850 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
  1. AA2Zb2y
Product

fractured photoresist/SiO2 layer/Si

Thickness: 100 nm

Thickness: 850 - 1200 nm

Medium/Support: none

References

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