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SiNx film

Based on

43 Articles
3 Patents
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon-rich silicon nitride

Si-reached silicon nitride silicon nitride a-SiNx SRSN
Type Single Compound
Formula SiN(x)
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
50-nt ssDNA individual translocation event count dependent on applied voltage

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Catalytic properties

Reaction Value Nanomaterial Variant Source
hydrogen evolution reaction under light illumination

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Applications

Area Application Nanomaterial Variant Source
analysis methods

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Characterization

Method Nanomaterial Variant Source
transmission electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. LwCgecOzXOmwDmTknS0Db
Product

SiNx film

Pore diameter: 6 - 70 nm

Thickness: 20 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • silicon hydride
  1. BIXcctap9VPQV
Product

SiNx film

Roughness: ~ 23.3 nm

Thickness: 50 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
Product

SiNx film

Hole diameter: 4 nm

Thickness: 5 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • p-type silicon
  • silicon hydride
  1. RVsZf3SUuyUeQ
  2. O1al1dDDE927b2Bz1
Product

SiNx film

Thickness: ~ 63.5 nm

Medium: none

Support: p-type silicon

Method 5

Type: Physical formation
Source:
Starting materials
  • silicon-rich silicon nitride
Product

SiNx film

Grating bar length: 946 - 966 nm

Grating bar width: 46 - 54 nm

Grating period: 103 - 107 nm

Slit width: 51 - 59 nm

Thickness: 45 nm

Medium/Support: none

References

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