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SiOx film

Based on

2 Patents
2014 Most recent source

Composition

1

silicon-rich silicon oxide

SRSO SiOx
Type Single Compound
Formula SiO(x)
Role raw materials

Properties

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. sX4RvL6qf2hp6GOTJdQtJlNYSPrvHREpB0orI
Product

SiOx film

Pattern pitch: 42 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. PnPyZ9Ex4i2uZ7PYYJd6DpGBO1huGIveybBDE6Trg9hsddfxaRGkBS8ypbhxvOichndktuXS9
  2. CxP5EsbrmCkY0RLMgovvMKeFgznwTebLF4Cnu
Product

SiOx film

Pattern pitch: 34.5 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. qfyuYm16IWSgbyxarv7dMcTwn9ijvMkOFsPmBM2G1yQR3l7RegANgjol8GZtslNwcz95Qy9MN
  2. eHsfh6vhUxmyl6m0XLoLGO0PmZJEvDjIjR1KW
Product

SiOx film

Pattern pitch: 28.4 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. pcxotvmkva3YI83sfafGhxehXLFfOqT0mVw0i
Product

SiOx film

Pattern pitch: 33.3 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. YpMBhWJoxGpVTm4T05uVw9jDwLs9eWN3UmxjV
Product

SiOx film

Pattern pitch: 41.9 nm

Medium/Support: none

References

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