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SiO2-supported tetralayer polymer film

Based on

1 Patents
2013 Most recent source

Composition

1

mixture of substance based on (poly (9,9-bis(4-hydroxyphenyl)fluorene/9,9-bis(4-hydroxyphenyl)fluorene/methylene glycol/methylene glycol)/poly (9,9-bis(4-hydroxyphenyl)fluorene/9,9-bis(4-hydroxyphenyl)fluorene/methylene glycol/methylene glycol)/C64H50O4/C64H50O4)

Type Complex Compound
Formula
Role layer
2

phenylsesquisiloxane/methylsesquisiloxane/siloxane copolymer

Type Complex Compound
Formula
Role layer
3

poly (-C16H24O2-/-C16H24O2-/-C11H12O5-/-C11H12O5-/-C14H20O3-/-C14H20O3-)

Type Polymer
Formula
Role layer
4

poly (-C13H18F6O3-/-C13H18F6O3-/-C10H12F6O3-/-C10H12F6O3-)

Type Polymer
Formula
Role layer

Properties

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • mixture of substance based on (poly (9,9-bis(4-hydroxyphenyl)fluorene/9,9-bis(4-hydroxyphenyl)fluorene/methylene glycol/methylene glycol)/poly (9,9-bis(4-hydroxyphenyl)fluorene/9,9-bis(4-hydroxyphenyl)fluorene/methylene glycol/methylene glycol)/C64H50O4/C64H50O4)
  1. q3AoEXOoSsnsxgeULaUdJtEqHiftmR9Ssw2kevD76J1BT6j25SVMQ5mdonz3mcAtbUXPZSAU9A
Product

SiO2-supported tetralayer polymer film

Thickness: 100 nm

Thickness: 35 nm

Thickness: 50 nm

Medium: none

Support: silicon dioxide

References

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