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few-layer MoS2 film on SiO2/Si

Based on

2 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
2

molybdenum(IV) sulfide

2H-MoS2
Type Single Compound
Formula MoS2
Role layer

Properties

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • silicon
  1. 28Jn
  2. npq
Product

few-layer MoS2 film on SiO2/Si

Hole depth: ~ 40 nm

Thickness: 90 nm

Medium: none

Support: silicon

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • diethyl disulfide
  • SiO2/Si
  • bis(tert-butylimido)bis(dimethylamino)molybdenum(VI)
  1. 62Tec
  2. h5Jei
  3. ILmKDKf7kA
Product

few-layer MoS2 film on SiO2/Si

Thickness: 90 nm

Medium: none

Support: silicon

Method 3

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • silicon
  • molybdenum(IV) sulfide
Product

few-layer MoS2 film on SiO2/Si

Thickness: 90 nm

Medium: none

Support: silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • silicon
  • molybdenum(IV) sulfide
Product

few-layer MoS2 film on SiO2/Si

Thickness: 90 nm

Medium: none

Support: silicon

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • diethyl disulfide
  • SiO2/Si
  • bis(tert-butylimido)bis(dimethylamino)molybdenum(VI)
  1. IQzCK
  2. T8HLn
  3. Ng0jgkk1d7
Product

few-layer MoS2 film on SiO2/Si

Thickness: 90 nm

Medium: none

Support: silicon

References

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