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gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

Based on

1 Articles
2013 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

aluminium

aluminum
Type Single Compound
Formula Al
Role layer
2

titanium

Type Single Compound
Formula Ti
Role layer
3

tantalum pentoxide

tantalum(V) oxide tantalum oxide
Type Single Compound
Formula O5Ta2
Role layer
4

gold

Type Single Compound
Formula Au
Role layer

Properties

General physical and chemical properties

Property Value Source
barrier height

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Applications

Area Application Source
electronics

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Characterization

Method Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
  1. rvyHN
  2. W9lA4tGflCYfzUlUmaC
Product

gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

Method 2

Type: Physical formation
Source:
  1. BYzlb
  2. Pjrky28IAq9rHAPWjH3
Product

gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

Method 3

Type: Physical formation
Source:
  1. OBtl4
  2. 5GFIwXo1CBAcvgrS33v
Product

gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

Method 4

Type: Physical formation
Source:
  1. jiu7TO
Product

gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

References

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