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gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

Based on

1 Articles
2013 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

aluminium

aluminum
Type Single Compound
Formula Al
Role layer
2

titanium

Type Single Compound
Formula Ti
Role layer
3

tantalum pentoxide

tantalum(V) oxide tantalum oxide
Type Single Compound
Formula O5Ta2
Role layer
4

gold

Type Single Compound
Formula Au
Role layer

Properties

General physical and chemical properties

Property Value Source

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Applications

Area Application Source

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Characterization

Method Source

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
  1. euMyw
  2. 3sjUEipiO8Nuq2WsakO
Product

gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

Method 2

Type: Physical formation
Source:
  1. R8z0w
  2. tcWk4VgFAsmCMx4JpZH
Product

gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

Method 3

Type: Physical formation
Source:
  1. 9c2Z4
  2. b4Q8my6yZvHlQllQysB
Product

gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

Method 4

Type: Physical formation
Source:
  1. VZRBFc
Product

gold/tantalum oxide/n-gallium nitride metal-insulator-semiconductor structure

References

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