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aluminum thin film on GaAs substrate

Based on

1 Articles
2011 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

low temperature gallium arsenide

gallium(III) arsenide gallium arsenide LTGaAs GaAs
Type Single Compound
Formula GaAs
Role layer
2

aluminium

aluminum
Type Single Compound
Formula Al
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
Hall resistivity dependent on temperature

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Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • arsenic
  • gallium
  1. BfRVXwAkR0WHOnzLPbyj
  2. E8GQVX
Product

aluminum thin film on GaAs substrate

Thickness: 200 nm

Thickness: 60 nm

Medium/Support: none

References

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