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P3HT:PCBM active layer on line-grated 300 nm thick AZ HIR 1075 photoresist layer

Based on

1 Articles
2011 Most recent source

Composition

1

line-grated 300 nm thick AZ HIR 1075 photoresist layer

Type Nano Material
Formula
Role layer
2

300 nm thick poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid methyl ester layer

300 nm thick P3HT:PCBM
Type Nano Material
Formula
Role layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • indium tin oxide
  • AZ HIR 1075 photoresist
Product

P3HT:PCBM active layer on line-grated 300 nm thick AZ HIR 1075 photoresist layer

Size: not specified

Medium: none

Support: indium tin oxide

References

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