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SiO2 film

Based on

350 Articles
21 Patents
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
Porosity

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refractive index

Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
compounds sensor for hepcidin in human serum

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Applications

Area Application Nanomaterial Variant Source
coatings

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electronics
raw materials/precursors/templates

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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field emission scanning electron microscopy
other
scanning electron microscopy
transmission electron microscopy
UV
UV-Vis spectroscopy
X-ray photoelectron spectroscopy

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicic acid tetraethyl ester
  1. IrxAzQeIGDxRYmfqKabwNX
Product

SiO2 film

Thickness: ~ 100 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicic acid tetraethyl ester
  1. 54psmFIsWuyX2a
Product

SiO2 film

Thickness: ~ 100 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • oxygen
Product

SiO2 film

Thickness: 200 nm

Medium: none

Support: silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • n-GaAs
Product

SiO2 film

Array diameter: ~ 160000 nm

Array periodicity: ~ 1000 nm

Hole diameter: 80 nm

Thickness: 20 nm

Medium: none

Support: n-GaAs

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • oxygen
  1. aaoVkWcosAK6u8HQyvbY0k5
  2. qZclCE5eh
Product

SiO2 film

Thickness: ~ 15 - ~ 80 nm

Medium: none

Support: silicon

References

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