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example of p-type doped semiconductor shallow layer

Based on

1 Articles
1 Patents
2013 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

germanium

Type Single Compound
Formula Ge
Role raw materials
2

tellurium

Type Single Compound
Formula Te
Role dopant

Properties

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
scanning tunneling microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • gallium(III) phosphide
  • germanium
  1. ArKRGI
Product

example of p-type doped semiconductor shallow layer

Size: not specified

Medium: none

Support: germanium

References

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