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patterned photoresist AR-3170 film on silicon

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

photoresist AR-3170

Type Complex Compound
Formula
Role raw materials

Properties

Applications

Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon
  • photoresist AR-3170
Product

patterned photoresist AR-3170 film on silicon

Interline spacing: 99.2 nm

Periodicity: 230 nm

Thickness: 100 nm

Medium: none

Support: silicon

References

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