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Si-based nanopore membrane structure with dielectric silica layer on expose silicon

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon nitride

Type Single Compound
Formula Si3N4
Role layer
2

boron-doped silicon

B-doped silicon
Type Complex Compound
Formula
Role layer
3

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
4

silicon-rich silicon nitride

Si-reached silicon nitride silicon nitride a-SiNx SRSN
Type Single Compound
Formula SiN(x)
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
current deviation

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Applications

Area Application Nanomaterial Variant Source
sensors (excluding biosensors)

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Characterization

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • boron-doped silicon
  • ammonia
  • dichlorosilane
Product

Si-based nanopore membrane structure with dielectric silica layer on expose silicon

Pore diameter: 10 nm

Thickness: 20 nm

Thickness: 200 nm

Thickness: 40 nm

Thickness: 500000 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • boron-doped silicon
  • ammonia
  • dichlorosilane
Product

Si-based nanopore membrane structure with dielectric silica layer on expose silicon

Pore diameter: 10 nm

Thickness: 20 nm

Thickness: 200 nm

Thickness: 30 nm

Thickness: 500000 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • boron-doped silicon
  • ammonia
  • dichlorosilane
Product

Si-based nanopore membrane structure with dielectric silica layer on expose silicon

Pore diameter: 10 nm

Thickness: 20 nm

Thickness: 200 nm

Thickness: 500000 nm

Thickness: 55 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • boron-doped silicon
  • ammonia
  • dichlorosilane
Product

Si-based nanopore membrane structure with dielectric silica layer on expose silicon

Pore diameter: 10 nm

Thickness: 20 nm

Thickness: 200 nm

Thickness: 500000 nm

Thickness: 60 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • boron-doped silicon
  • ammonia
  • dichlorosilane
Product

Si-based nanopore membrane structure with dielectric silica layer on expose silicon

Pore diameter: 10 nm

Thickness: 20 nm

Thickness: 200 nm

Thickness: 50 nm

Thickness: 500000 nm

Medium/Support: none

References

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