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line-space patterned positive resist film

Based on

1 Patents
2013 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

positive resist composition

Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Source
expose latitude

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Applications

Area Application Source
nanoprinting/nanolithography

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Characterization

Method Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • positive resist composition
  1. Rhs0xBs4IlsemBiISxgdxdDb8GG8x7xnIxpqHVF9odcgQoz6Bkw2
Product

line-space patterned positive resist film

References

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