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line-space patterned positive resist film

Based on

1 Patents
2013 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

positive resist composition

Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
expose latitude

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Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • positive resist composition
  1. S0py5M4RQn6ThCB2XPy6EICk13jTc6BrnaO3XPtVCNolsEPX5MSj
Product

line-space patterned positive resist film

Line width: 50 nm

Pitch width: 100 nm

Thickness: 80 nm

Medium/Support: none

References

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