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ITO thin film

Based on

27 Articles
2017 Most recent source

Composition

1

tin-doped indium oxide

indium tin oxide ITO
Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electrical resistivity

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refractive index
sheet resistance

Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
compounds sensor for toluene

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Applications

Area Application Nanomaterial Variant Source
optoelectronics

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power generation

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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scanning electron microscopy
UV
UV-Vis spectroscopy
X-ray diffraction

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • soda-lime-silica glass
  • tin-doped indium oxide ceramic target
  1. 73yojpexPRHO
  2. Tf48yeniYq9E9G
  3. ewu6w
  4. AzQQsB
Product

ITO thin film

Crystallite size: 29 nm

Grain size: 44 nm

RMS roughness: 4.13 nm

Roughness: ~ 4.06 nm

Medium: none

Support: soda-lime-silica glass

Method 2

Type: Physical formation
Source:
Starting materials
  • soda-lime-silica glass
  • tin-doped indium oxide ceramic target
  1. 2JnYoVfL9oZs
  2. dBW1Brj4TCyNdw
  3. acKaO
  4. wN11uc
Product

ITO thin film

Crystallite size: 26 nm

Grain size: 39 nm

RMS roughness: 4.38 nm

Roughness: ~ 4.26 nm

Medium: none

Support: soda-lime-silica glass

Method 3

Type: Physical formation
Source:
Starting materials
  • indium tin oxide powder mixture
  • quartz
  1. T5yCeCmT2rb6D
  2. S70B5
Product

ITO thin film

Grain size: < 100 nm

Roughness: 12.3 nm

Thickness: ~ 200 nm

Medium: none

Support: quartz

Method 4

Type: Physical formation
Source:
Starting materials
  • soda-lime-silica glass
  • tin-doped indium oxide ceramic target
  1. MoU4l1CK4206
  2. PInwz0nWmrO8ze
  3. GvIVo
  4. ySwXFc
Product

ITO thin film

Crystallite size: 22 nm

Grain size: 32 nm

RMS roughness: 4.58 nm

Roughness: ~ 4.45 nm

Medium: none

Support: soda-lime-silica glass

Method 5

Type: Physical formation
Source:
Starting materials
  • tin-doped indium oxide
  1. yrMRQHkmVUAPOpneetOR3kP1Wp9n
Product

ITO thin film

Line height: 350.3 nm

Line thickness: 17.3 nm

Medium/Support: none

References

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