Loading ...

Fast insight into nanotechnology

Access easily searchable nanoscience data, synthesis methods and literature

1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane film on hydroxylated silicon

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane

octacyclohexenyldimethylsilyl-POSS
Type Single Compound
Formula C80H152O20Si16
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electron density plot dependent on solution concentration

More information available to subscribers only.

Or, view sample content

Applications

Characterization

Method Nanomaterial Variant Source
X-ray reflectometry

More information available to subscribers only.

Or, view sample content

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon
  • 1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane
  1. xWGspnwspEl4Lhsy
Product

1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane film on hydroxylated silicon

Roughness: ~ 0.9 nm

Thickness: 13 - 30 nm

Medium: none

Support: silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • silicon
  • 1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane
  1. 7IEb2tI9axnNFSwuWvq
Product

1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane film on hydroxylated silicon

Roughness: ~ 0.9 nm

Thickness: 13 - 30 nm

Medium: none

Support: silicon

Method 3

Type: Physical formation
Source:
Starting materials
  • silicon
  • 1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane
  1. 144MfSsR8iZXF17gRt9gIw
Product

1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane film on hydroxylated silicon

Roughness: ~ 0.9 nm

Thickness: 13 - 30 nm

Medium: none

Support: silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • silicon
  • 1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane
  1. IpKRCHRTegJOrjhE
Product

1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane film on hydroxylated silicon

Roughness: ~ 0.9 nm

Thickness: 13 - 30 nm

Medium: none

Support: silicon

Method 5

Type: Physical formation
Source:
Starting materials
  • silicon
  • 1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane
  1. 2aRSTb5weQoM
Product

1,3,5,7,9,1,13,15-octa[2-(3-cyclohexenyl)ethyldimethylsiloxy]pentacyclo[9.5.1.13,9.15,15.17,13]octasilane film on hydroxylated silicon

Roughness: ~ 0.9 nm

Thickness: 13 - 30 nm

Medium: none

Support: silicon

References

Full content is available to subscribers only

To view content please choose from the following:

We use cookies to improve your experience with our site. More information

Sign up for a free trial