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free-standing poly(polyhedral oligomeric silsesquioxane)-(amic acid) layer

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

-C24H54Cl2N2O12Si8-

Type Single Compound
Formula -C24H54Cl2N2O12Si8-
Role raw materials
2

-C19H10F6N2O6-

Type Single Compound
Formula -C19H10F6N2O6-
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
bulk density

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Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • ammonium chloride salt functionalized polyhedral oligomeric silsesquioxane
  1. 2wc6YXmKThL0Y0Fo7W2fiwZgXm
  2. n3pEzwgRayUisOj
Product

free-standing poly(polyhedral oligomeric silsesquioxane)-(amic acid) layer

Thickness: 100 nm

Medium/Support: none

References

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