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HfO2 film

Based on

48 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

hafnium(IV) oxide

hafnium dioxide hafnium oxide hafnia
Type Single Compound
Formula HfO2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
band energy diagram

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Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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X-ray photoelectron spectroscopy

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • molybdenum(IV) sulfide
Product

HfO2 film

Island height: ~ 15 - ~ 10 nm

Island width: ~ 60 nm

Thickness: ~ 15 - ~ 10 nm

Medium: none

Support: molybdenum(IV) sulfide

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • tetrakis(dimethylamido)-hafnium(IV)
  • n-doped silicon
  • water
  1. Vq7L
Product

HfO2 film

RMS roughness: 0.2 - 0.3 nm

Thickness: 20 nm

Medium: none

Support: n-doped silicon

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicon-germanium
  • ethyl(methyl)[tris[ethyl(methyl)amino]hafnio]amine
  1. fAQ4AVHFzXCb7Qz
  2. GG4pslVHUHDImaxLttBVoMy2r
Product

HfO2 film

Thickness: ~ 3 nm

Medium: none

Support: silicon-germanium

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • molybdenum(IV) sulfide
Product

HfO2 film

Island height: ~ 15 - ~ 10 nm

Island width: ~ 60 nm

Thickness: ~ 15 - ~ 10 nm

Medium: none

Support: molybdenum(IV) sulfide

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • tetrakis(dimethylamido)-hafnium(IV)
  • n-doped silicon
  • water
  1. Ray0u
Product

HfO2 film

RMS roughness: 3 nm

Thickness: 100 nm

Medium: none

Support: n-doped silicon

References

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